Chemical Processing Of Dielectrics, Insulators And Electronic Ceramics: Volume 606 (Mrs Proceedings)

This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..

• • Author: Anthony C. Jones, Janice Veteran, Donald Mullin, Reid Cooper, Sanjeev Kaushal
• • Publisher: Cambridge University Press
• • Publication Date: Jun 05, 2014
• • Number of Pages: 328 pages
• • Language: English
• • Binding: Paperback
• • ISBN-10: 1107413206
• • ISBN-13: 9781107413207